Exploring corrosion behavior, antimicrobial evaluation, molecular docking and DFT calculation of thiosemicarbazone ligand and its metal complexes
Abstract
Abstract In the current study, the execution of thiosemicarbazone ligand (HL) as a novel corrosion inhibitor for copper metal in 1 M HCl solution was evaluated through the electrochemical measurements which includes (open circuit potential (OCP) potentiodynamic polarization (PDP) and electrochemical impedance spectroscopy (EIS). The results confirmed that the ligand (HL) acted as a good corrosion inhibitor for copper metal in 1 M HCl solution; as it displayed high percentage of inhibition efficiency about 94.66% and 92.93% after PDP and EIS methods respectively; at its optimum concentration (1 × 10–7 M). The morphology and surface constituents of the sample were examined before and after addition of the ligand (HL) by using the analysis (scanning electron microscope and an energy dispersive X-ray spectroscopy) which clarified the passivation effect of the ligand (HL) after formation of a protective layer of its adsorbed molecules on the surface of the copper sample. In addition, the metal complexes Ni (II), Co (II) and Cd (II) derived from thiosemicarbazone ligand (HL) were used in this study to shed light on some of their electrochemical properties. But based on their nature as they are insoluble in aqueous media the cyclic voltammetry method was used in this section. The results deducted from cyclic voltammetry technique showed that, the oxidation–reduction process of the ligand (HL) and its metal complexes Ni (II), Co (II) and Cd (II) under quasi-reversible system and the…
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