Improved System for Fabrication and Characterization of Nanophotonic Devices by Multi-photon Lithography
Abstract
A new system for multi-photon lithography (MPL) was developed and used to fabricate three-dimensional (3D) structures with higher aspect ratio, better resolution, improved fidelity, and reduced structural distortion relative to a conventional implementation of MPL. A set of curved waveguides (Rbend = 19 μm, and 38 μm) and straight waveguides (length = 50 μm, Rbend = ∞) were fabricated in an epoxide photopolymer and optically characterized using light having a wavelength in vacuum of λ0 = 2.94 μm. The optical performance of the waveguides was compared to novel spatially-variant photonic crystals (SVPCs) previously studied in the group. The waveguides were found to guide light with 90% lower efficiency, due to mode leakage. The study provides further evidence that SVPCs operate not through total internal reflection, but rather through self-collimation, as designed. 3D uniform-lattice photonic crystals (ULPCs) were fabricated by MPL using a commercial acrylate photopolymer. The ULPCs were optically characterized at λ0 = 1.55 μm. A laser beam with adjustable bandwidth was used to measure the self-collimation in the ULPCs. For the low bandwidth beam, vertically polarized light was self-collimated, whereas horizontally polarized light diverged. The transmission efficiency of the ULPCs was also measured as a function of fill factor. The ULPC having a fill factor of 48% exhibited 80% transmission. An etching process was also developed for non-destructively removing Au/Pd coatings…
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