N+-ion implantation induced enhanced conductivity in polycrystalline and single crystal diamond
Abstract
With the 200 keV N+-ion implantation technique and a systematic variation of fluence, we report on the formation of highly conducting n-type diamond where insulator-to-metal transition (IMT) is observed above a certain fluence wherein the conductivity no longer obeys the hopping mechanism of transport rather, it obeys quantum corrections to Boltzmann conductivity at concentrations of nN ≥ 2 × 1020 cm−3. The conductivity for ultra-nanocrystalline diamond is found to be high, ∼650 Ω−1 cm−1 with thermal activation energy Ea ∼ 4 meV. Interestingly, with gradual increase in fluence, the conductivity in polycrystalline diamond films has been seen to progress from the hopping mechanism of transport in the case of low fluence implantation to a semiconducting nature with medium fluence and finally a semi-metallic conduction is observed where percolation occurs giving an insulator-to-metal transition. XANES confirms that the long-range order in diamond films remains intact when implanted with low and medium fluences; while implantation at sufficiently high fluences >5 × 1016 cm−2 leads to the formation of a disordered tetrahedral amorphous carbon network leading to metallic conduction resembling a metallic glass behaviour. XPS confirms that the sp2 fraction increases gradually with fluence starting from only 6% in the case of low fluence implantations and saturates at 40–50% for implantation at high fluences. A similar observation can be made for single crystal diamond when implanted…
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